Chemical vapor deposited silicon carbide mirrors for extreme ultraviolet applications
Saha, Timo T.; Leviton, Douglas B.; Fleetwood, Charles M.; Keski-Kuha, Ritva A.; Osantowski, John F.; Wright, Geraldine A.; Boucarut, Rene A.; Madison, Timothy J.
Spain
Abstract
Advances in optical coating and materials technology have made possible the development of instruments with substantially improved efficiency in the extreme ultraviolet (EUV). For example, the development of the chemical vapor deposition (CVD) SiC mirrors provides an opportunity to extend the range of normal-incidence instruments dow to 60 nm. CVD SiC is a highly polishable material yielding low- scattering surfaces. High UV reflectivity and desirable mechanical and thermal properties make CVD SiC an attractive mirror and/or coating material for EUV applications. The EUV performance of SiC mirrors, as well as some strengths and problem areas, is discussed.